Design of Refractive/Diffractive Hybrid Projection Lens for DMD-Based Maskless Lithography
نویسندگان
چکیده
The projection lens is the core component of DMD-based maskless lithography and its imaging quality directly affects transferal exposure pattern. Based on traditional system, we have designed diffractive optical element (DOE) aspheric surfaces to optimize refractive/diffractive hybrid system improve quality. We found that best effect obtained when DOE very close front group before diaphragm system. Compared with this has lower wave aberration help DOE, higher image owing modulation transfer function (MTF) value being improved. Finally, a working distance 29.07 mm, Space NA 0.45, total length 196.97 mm designed. maximum distortion field curvature are 1.36 × 10−5% 0.91 μm, respectively.
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ژورنال
عنوان ژورنال: Optics
سال: 2021
ISSN: ['2328-7810', '2328-7780']
DOI: https://doi.org/10.3390/opt2020011